Esmar, Budi (2014) MODELING OF REACTIVE MAGNETRON SPUTTERING IN TIALN FILM DEPOSITION: ANALYSIS OF PUMPSPEED AND TARGET CURRENT EFFECT. Proceeding of International Conference On Research, Implementation And Education Of Mathematics And Sciences 2014. (Submitted)
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Abstract
A model of reactive magnetron sputtering has been developed by using mathematic model. The effect of high pump speed pump and target current in TiAlN coating deposition were studied. The results showed that high pump speed and target current increase the critical nitrogen flow rate in achieving stoichiometery of TiAlN coating composition. The opertion of high pump speed eliminated the hysteris effect, while high target current did not affect to the process.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | Mathematical model, reactive magnetron sputtering, TiAlN films, pump speed, target current, nitrogen flow rate. |
| Subjects: | Prosiding > ICRIEMS 2014 > PHYSICS & PHYSICS EDUCATION |
| Divisions: | Fakultas Matematika dan Ilmu Pengetahuan Alam (FMIPA) > Pendidikan Fisika > Fisika |
| Depositing User: | Eprints |
| Date Deposited: | 07 Nov 2014 04:27 |
| Last Modified: | 07 Nov 2014 04:27 |
| URI: | http://eprints.uny.ac.id/id/eprint/11529 |
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