eprintid: 11529
rev_number: 6
eprint_status: archive
userid: 3
dir: disk0/00/01/15/29
datestamp: 2014-11-07 04:27:53
lastmod: 2014-11-07 04:27:55
status_changed: 2014-11-07 03:50:51
type: article
metadata_visibility: show
creators_name: Esmar, Budi
title: MODELING OF REACTIVE MAGNETRON SPUTTERING IN TIALN FILM DEPOSITION: ANALYSIS OF PUMPSPEED AND TARGET CURRENT EFFECT
ispublished: submitted
subjects: KIM14
divisions: fmipa_jurdik_fisika_fisika
full_text_status: public
keywords: Mathematical model, reactive magnetron sputtering, TiAlN films, pump speed, target current, nitrogen flow rate.
abstract: A model of reactive magnetron sputtering has been developed by using mathematic model. The effect of high pump speed pump and target current in TiAlN coating deposition were studied. The results showed that high pump speed and target current increase the critical nitrogen flow rate in achieving stoichiometery of TiAlN coating composition. The opertion of high pump speed eliminated the hysteris effect, while high target current did not affect to the process.
date: 2014-05
date_type: submitted
publication: Proceeding of International Conference On Research, Implementation And Education Of Mathematics And Sciences 2014
publisher: Yogyakarta State University
refereed: TRUE
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citation:   Esmar, Budi  (2014) MODELING OF REACTIVE MAGNETRON SPUTTERING IN TIALN FILM DEPOSITION: ANALYSIS OF PUMPSPEED AND TARGET CURRENT EFFECT.  Proceeding of International Conference On Research, Implementation And Education Of Mathematics And Sciences 2014.      (Submitted)  
document_url: http://eprints.uny.ac.id/11529/1/04-Esmar%20Budi.rtf