TY  - JOUR
AV  - public
UR  - http://eprints.uny.ac.id/11529/
A1  - Esmar, Budi
Y1  - 2014/05//
N2  - A model of reactive magnetron sputtering has been developed by using mathematic model. The effect of high pump speed pump and target current in TiAlN coating deposition were studied. The results showed that high pump speed and target current increase the critical nitrogen flow rate in achieving stoichiometery of TiAlN coating composition. The opertion of high pump speed eliminated the hysteris effect, while high target current did not affect to the process.
ID  - UNY11529
TI  - MODELING OF REACTIVE MAGNETRON SPUTTERING IN TIALN FILM DEPOSITION: ANALYSIS OF PUMPSPEED AND TARGET CURRENT EFFECT
JF  - Proceeding of International Conference On Research, Implementation And Education Of Mathematics And Sciences 2014
KW  - Mathematical model
KW  -  reactive magnetron sputtering
KW  -  TiAlN films
KW  -  pump speed
KW  -  target current
KW  -  nitrogen flow rate.
PB  - Yogyakarta State University
ER  -