relation: http://eprints.uny.ac.id/11529/
title: MODELING OF REACTIVE MAGNETRON SPUTTERING IN TIALN FILM DEPOSITION: ANALYSIS OF PUMPSPEED AND TARGET CURRENT EFFECT
creator: Esmar, Budi
subject: PHYSICS & PHYSICS EDUCATION
description: A model of reactive magnetron sputtering has been developed by using mathematic model. The effect of high pump speed pump and target current in TiAlN coating deposition were studied. The results showed that high pump speed and target current increase the critical nitrogen flow rate in achieving stoichiometery of TiAlN coating composition. The opertion of high pump speed eliminated the hysteris effect, while high target current did not affect to the process.
publisher: Yogyakarta State University
date: 2014-05
type: Article
type: PeerReviewed
format: text
language: en
identifier: http://eprints.uny.ac.id/11529/1/04-Esmar%20Budi.rtf
identifier:   Esmar, Budi  (2014) MODELING OF REACTIVE MAGNETRON SPUTTERING IN TIALN FILM DEPOSITION: ANALYSIS OF PUMPSPEED AND TARGET CURRENT EFFECT.  Proceeding of International Conference On Research, Implementation And Education Of Mathematics And Sciences 2014.      (Submitted)